Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. Power
Silicon carbon films were deposited using a hybrid radio frequency (r.f.) plasma enhanced chemical vapor deposition (PECVD)/sputtering deposition system at different r.f. powers. This deposition system combines the advantages of r.f. PECVD and sputtering techniques for the deposition of silicon carb...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Published: |
2013
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| Subjects: | |
| Online Access: | http://eprints.um.edu.my/7185/ |
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