In-situ tuning of Sn doped In2O3 (ITO) films properties by controlling deposition Argon/Oxygen flow

• Main Authors: Najwa, S., Shuhaimi, Ahmad, Talik, Noor Azrina, Ameera, N., Sobri, M., Rusop, Mohamad
• Format: Article
• Published: Elsevier 2019
• Subjects: Q Science (General); QC Physics
• Online Access: http://eprints.um.edu.my/23894/; https://doi.org/10.1016/j.apsusc.2019.01.123

In this work, we report that the properties of Sn-doped In 2 O 3 (ITO) can be properly tuned by varying Argon/ Oxygen (Ar/O 2 ) percentage during the sputtering process from 7% O 2 to 93% O 2 . The characteristics of the ITO grown in oxygen deficient to the oxygen-rich condition are properly studied...