Intermixing reactions in electrodeposited Cu/Sn and Cu/Ni/Sn multilayer interconnects during room temperature and high temperature aging

Current push for miniaturization and 3D packaging makes it important to understand reactions in interconnects with ultra small volume. In order to reduce processing time and to have more homogeneous interconnects, solder can be designed in a multilayer form with components layer thickness in the sub...

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Bibliographic Details
Main Authors: Chia, P.Y., Haseeb, A.S. Md. Abdul
Format: Article
Language:English
Published: Springer 2015
Subjects:
Online Access:http://eprints.um.edu.my/13857/1/Intermixing_reactions_in_electrodeposited_CuSn_and_CuNiSn.pdf
http://eprints.um.edu.my/13857/
http://link.springer.com/article/10.1007/s10854-014-2398-9
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