Microstructural and optical properties of ZrON/Si thin films

ZrON/Si(100) layer structure formation has been produced by oxidation/nitridation of sputtered Zr metal in N2O/Ar ambient at 500–900 °C. Micromorphology and structural properties of the films have been evaluated by scanning electron microscopy, atomic force microscopy, and reflection high-energy ele...

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Main Authors: Atuchin, V.V., Kruchinin, V.N., Wong, Y.H., Cheong, K.Y.
格式: Article
出版: Elsevier 2013
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在线阅读:http://eprints.um.edu.my/13006/
http://www.sciencedirect.com/science/article/pii/S0167577X13004291
http://dx.doi.org/10.1016/j.matlet.2013.03.100
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