Uniform growth of MoS2 films using ultra-low MoO3 precursor in one-step heating chemical vapor deposition
In chemical vapor deposition (CVD), homogeneous molybdenum vapor concentration is important in synthe- sizing uniform thickness and large coverage of two-dimensional molybdenum disulfide (2D-MoS2) films. Here, we synthesize few-layer MoS2 films with uniform thickness and adequate coverage over 50 mm...
Saved in:
Main Authors: | Sirat, Mohamad Shukri, Johari, Muhammad Hilmi, Mohmad, Abdul Rahman, Mohammad Haniff, Muhammad Aniq Shazni, Ani, Mohd Hanafi, Syono, Mohd Ismahadi, Mohamed, Mohd Ambri |
---|---|
Format: | Article |
Language: | English English |
Published: |
Elsevier
2022
|
Subjects: | |
Online Access: | http://irep.iium.edu.my/97769/1/97769_Uniform%20growth%20of%20MoS2%20films_SCOPUS.pdf http://irep.iium.edu.my/97769/7/97769_Uniform%20growth%20of%20MoS2%20films.pdf http://irep.iium.edu.my/97769/ https://www.journals.elsevier.com/thin-solid-films |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Direct growth and properties of few-layer MoS2 on multilayer graphene prepared by chemical vapor deposition
by: Sirat, Mohamad Shukri, et al.
Published: (2022) -
Evolution of the Polarizing Effect of MoS2
by: Sathiyan, S., et al.
Published: (2015) -
Fabrication of MoS2-rGO and MoS2-ZIF-8 membranes supported on flat alumina substrate for effective oil removal
by: Othman, Nur Hidayati, et al.
Published: (2022) -
Synthesis and Characterization of MoS2 Films for PEC cells
by: T., Joseph Sahaya Anand
Published: (2009) -
Low-temperature nitrogen doping of nanocrystalline graphene films with tunable Pyridinic-N and Pyrrolic-N by cold-wall plasma-assisted chemical vapor deposition
by: Zainal Ariffin, Nur Hamizah, et al.
Published: (2021)