A study on controllable aluminium doped zinc oxide patterning by chemical etching for MEMS application

• Main Authors: Md Ralib @ Md Raghib, Aliza 'Aini, Nordin, Anis Nurashikin, A. Malik, Noreha, Othman, Raihan, Alam, A. H. M. Zahirul, Khan, Sheroz, Mortada, Ossama, Crunteanu, Aurelian, Chatras, Matthieu, Orlianges, Jean Christophe, Blondy, Pierre
• Format: Article
• Language: English; English; English
• Published: Springer Berlin Heidelberg 2017
• Subjects: TK7800 Electronics. Computer engineering. Computer hardware. Photoelectronic devices
• Online Access: http://irep.iium.edu.my/49259/1/Microsystems_2016.pdf; http://irep.iium.edu.my/49259/9/49259_A%20study%20on%20controllable%20aluminium_scopus.pdf; http://irep.iium.edu.my/49259/14/49259_A%20study%20on%20controllable%20aluminium%20doped_article.pdf; http://irep.iium.edu.my/49259/; http://link.springer.com/article/10.1007%2Fs00542-015-2783-1

This present work reports on the study of controllable aluminium doped zinc oxide (AZO) patterning by chemical etching for MEMS application. The AZO thin film was prepared by RF magnetron sputtering as it is capable of producing uniform thin film at high deposition rates. X-Ray diffraction (XRD) and...