Development of low normal force contact using electro fine forming and lithography technology

• Main Authors: Bhuiyan, Moinul, Yamada, Shinji, Kurokawa, Noriharu, Sakamoto, Katsuhiko, Takemasa, Eiichiro
• Format: Conference or Workshop Item
• Language: English; English
• Published: 2008
• Subjects: TA401 Materials of engineering and construction
• Online Access: http://irep.iium.edu.my/33190/1/Development_of_Low_Normal_Force_Contact_Using_Electro_Fine_Forming_and_Lithography_Technology.pdf; http://irep.iium.edu.my/33190/4/TE_Technical_Conference_2008.jpg; http://irep.iium.edu.my/33190/; http://www.te.com/en/home.html

This new technology is realized by Photo Resist Lithography and NiCo Electro Fine Forming Process, and enables the design of a small contact spring for applications requiring high density, high speed and high durability. The evaluation result proved the capability of Low Normal Force (0.10N-0.15N at...