Anomalous acid diffusion in a triphenylene molecular resist with melamine crosslinker
Next generation lithography will require next generation resists. Molecular resists, based on small nonpolymeric molecules, promise improvements in line width roughness and resolution control for high resolution lithographic patterns. However, these materials are generally not sensitive enough for...
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| Format: | Article |
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2008
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| Online Access: | http://eprints.utp.edu.my/883/1/anomalous_acid_sciencedirect_2008.pdf http://eprints.utp.edu.my/883/ |
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