Surface roughness and morphology analysis using an atomic force microscopy of polycrystalline diamond coated Si3N4 deposited by microwave plasma assisted chemical vapor deposition

Diamond is the hardest material and has high chemical resistant which is one form of carbon. In the present work a study was carried out on polycrystalline diamond coated Si3N4 substrate. The diamond was deposited by Microwave Plasma Assisted Chemical Vapor Deposition (MPACVD) under varying depositi...

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Bibliographic Details
Main Authors: Purniawan, A., Hamzah, Esah, Mohd Toff, Mohd Radzi
Format: Article
Published: Scitec Publications Ltd. 2008
Subjects:
Online Access:http://eprints.utm.my/id/eprint/7704/
http://dx.doi.org/10.4028/www.scientific.net/SSP.136.153
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