Studies of the self-assembled growth mechanism on nanocrystalline silicon nanodots

Nanocrystalline silicon (nc-Si) nanodots have been grown on corning glass (7059) substrate using a self-assembly VHF-PECVD method under the following experimental conditions: Fixed deposition temperatures of 300/400 °C, deposition times 30/60 s, plasma power of 10 W, silane gas flow rate of 10 sccm,...

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Bibliographic Details
Main Authors: Sakrani, Samsudi, Sumpono, Imam, Tarjudin, Nurul Aini, Othaman, Zulkafli
Format: Article
Language:English
Published: Ibnu Sina Institute for Fundamental Science Studies, UTM 2010
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Online Access:http://eprints.utm.my/id/eprint/38423/1/SamsudiSakrani2010_StudiesoftheSelfAssembledGrowthMechanismon.pdf
http://eprints.utm.my/id/eprint/38423/
http://mjfas.ibnusina.utm.my/index.php/jfs/article/view/183
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