Cover Image

Morphological studies of silicon carbide thin film deposited by very high frequency - plasma enhanced chemical vapour deposition through gas dilution adjustment

Dilution of gas was deployed to investigate the surface morphology and the surface topography of Silicon Carbide (SiC) film deposited using Very High Frequency – Plasma Enhanced Chemical Vapour Deposition (VHF-PECVD) technique. The deposition process of SiC thin film was performed with 150 MHz excit...

Full description

Saved in:
Bibliographic Details
Main Authors: Ibrahim, Zainur Atika, Omar, Muhammad Firdaus, Ismail, Abd. Khamim
Format: Article
Language:English
Published: Malaysian Society of Analytical Sciences 2022
Subjects:
QC Physics
Online Access:http://eprints.utm.my/id/eprint/102768/1/MuhammadFirdausOmar2022_MorphologicalStudiesofSiliconCarbideThin.pdf
http://eprints.utm.my/id/eprint/102768/
https://mjas.analis.com.my/mjas/v26_n5/pdf/Zainur_26_5_18.pdf
Tags: Add Tag
No Tags, Be the first to tag this record!

Internet

http://eprints.utm.my/id/eprint/102768/1/MuhammadFirdausOmar2022_MorphologicalStudiesofSiliconCarbideThin.pdf
http://eprints.utm.my/id/eprint/102768/
https://mjas.analis.com.my/mjas/v26_n5/pdf/Zainur_26_5_18.pdf

Similar Items