TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films
The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope. An expansion of the lattice by nearly 5% was observed for the Ni0.8Al0.2 films in their low-thickness and as-depo...
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2011
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my.utem.eprints.47082015-05-28T03:27:33Z http://eprints.utem.edu.my/id/eprint/4708/ TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films T. Joseph, Sahaya Anand TJ Mechanical engineering and machinery The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope. An expansion of the lattice by nearly 5% was observed for the Ni0.8Al0.2 films in their low-thickness and as-deposited state. The lattice size approaches the bulk value when the film thickness increases or after vacuum annealing heat-treatment. The Ni0.8Al0.2 films have a nanocrystalline structure in which the ordered L12 phase appears upon annealing at above 500°C. The ordered B2 phase Ni4Al phase with orthorhombic structure were found. 2011-01 Conference or Workshop Item PeerReviewed text/html en http://eprints.utem.edu.my/id/eprint/4708/1/SJC_Invited.pdf application/pdf en http://eprints.utem.edu.my/id/eprint/4708/2/SJC_Invited.pdf T. Joseph, Sahaya Anand (2011) TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films. In: International Conference on Nanotechnology and Ultrasound, 12 - 14 January 2011, Tiruchirapalli, INDIA. |
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TJ Mechanical engineering and machinery T. Joseph, Sahaya Anand TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films |
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The nanostructural characteristics of direct-current magnetron sputter-deposited Ni4Al alloy films were studied during in situ isothermal annealing in a transmission electron microscope. An expansion of the lattice by nearly 5% was observed for the Ni0.8Al0.2 films in their low-thickness and as-deposited state. The lattice size approaches the bulk value when the film thickness increases or after vacuum annealing heat-treatment. The Ni0.8Al0.2 films have a nanocrystalline structure in which the ordered L12 phase appears upon annealing at above 500°C. The ordered B2 phase Ni4Al phase with orthorhombic structure were found. |
format |
Conference or Workshop Item |
author |
T. Joseph, Sahaya Anand |
author_facet |
T. Joseph, Sahaya Anand |
author_sort |
T. Joseph, Sahaya Anand |
title |
TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films |
title_short |
TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films |
title_full |
TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films |
title_fullStr |
TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films |
title_full_unstemmed |
TEM Studies of SPUTTER-DEPOSITED Ni4Al Alloy Thin Films |
title_sort |
tem studies of sputter-deposited ni4al alloy thin films |
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2011 |
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http://eprints.utem.edu.my/id/eprint/4708/1/SJC_Invited.pdf http://eprints.utem.edu.my/id/eprint/4708/2/SJC_Invited.pdf http://eprints.utem.edu.my/id/eprint/4708/ |
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13.18916 |