On the fabrication of aluminum doped silica preform using MCVD and solution doping technique

• المؤلفون الرئيسيون: Aljamimi, Salah Mohammed, Mat Sharif, Khairul Anuar, Muhamad Yassin, Shahrin Zen, Zulkifli, Mohd Imran, Tamchek, Nizam, Yusoff, Zulfadzli, Abdul Rashid, Hairul Azhar
• التنسيق: Conference or Workshop Item
• اللغة: English
• منشور في: IEEE 2012
• الوصول للمادة أونلاين: http://psasir.upm.edu.my/id/eprint/69505/1/On%20the%20fabrication%20of%20aluminum%20doped%20silica%20preform%20using%20MCVD%20and%20solution%20doping%20technique.pdf; http://psasir.upm.edu.my/id/eprint/69505/

This paper provides detailed discussions on the fabrication of aluminum doped silica preform using solution doping technique and modified chemical vapor deposition (MCVD). The porous core layer was deposited at 1750°C with 30cm in deposition length. The soot formed at the inlet and outlet segment of...