Numerical investigation of channel width variation in junctionless transistors performance

Double gate junctionless (DGJLT) transistor, as a pinch off device, was previously fabricated. In this letter, the impact of channel width variation on behaviour of the device is studied by means of 3D-TCAD simulation tool. In this matter, the transfer characteristics, energy band diagram (valence/c...

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Main Authors: Dehzangi, Arash, Larki, Farhad, Yeop Majlis, Burhanuddin, Hamidon, Mohd Nizar, N V Visvanathan, P. Susthitha Menon, Jalar @ Jalil, Azman, Islam, Md. Shabiul, Md. Ali, Sawal Hamid
Format: Conference or Workshop Item
Language:English
Published: IEEE 2013
Online Access:http://psasir.upm.edu.my/id/eprint/69155/1/Numerical%20investigation%20of%20channel%20width%20variation%20in%20junctionless%20transistors%20performance.pdf
http://psasir.upm.edu.my/id/eprint/69155/
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spelling my.upm.eprints.691552019-06-12T07:36:05Z http://psasir.upm.edu.my/id/eprint/69155/ Numerical investigation of channel width variation in junctionless transistors performance Dehzangi, Arash Larki, Farhad Yeop Majlis, Burhanuddin Hamidon, Mohd Nizar N V Visvanathan, P. Susthitha Menon Jalar @ Jalil, Azman Islam, Md. Shabiul Md. Ali, Sawal Hamid Double gate junctionless (DGJLT) transistor, as a pinch off device, was previously fabricated. In this letter, the impact of channel width variation on behaviour of the device is studied by means of 3D-TCAD simulation tool. In this matter, the transfer characteristics, energy band diagram (valence/conduction band) and normal electric field along the nanowire between the source and the drain are studied at pinch off state. By decreasing the nanowire width, the on current decreases. Threshold voltage also reduced by decreasing the wire width. The highest electric field occurs at off state and the normal component of the electric field is stronger for smaller channel width. At pinch off state, the energy band diagrams revealed that a potential barrier against the current flow was built in channel which the smallest width has higher potential barrier. The overall result agrees with the behaviour of the nanowire junctionless transistors. IEEE 2013 Conference or Workshop Item PeerReviewed text en http://psasir.upm.edu.my/id/eprint/69155/1/Numerical%20investigation%20of%20channel%20width%20variation%20in%20junctionless%20transistors%20performance.pdf Dehzangi, Arash and Larki, Farhad and Yeop Majlis, Burhanuddin and Hamidon, Mohd Nizar and N V Visvanathan, P. Susthitha Menon and Jalar @ Jalil, Azman and Islam, Md. Shabiul and Md. Ali, Sawal Hamid (2013) Numerical investigation of channel width variation in junctionless transistors performance. In: 2013 IEEE Regional Symposium on Micro and Nano Electronics (RSM 2013), 25-27 Sept. 2013, Langkawi, Kedah, Malaysia. (pp. 101-104). 10.1109/RSM.2013.6706483
institution Universiti Putra Malaysia
building UPM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Putra Malaysia
content_source UPM Institutional Repository
url_provider http://psasir.upm.edu.my/
language English
description Double gate junctionless (DGJLT) transistor, as a pinch off device, was previously fabricated. In this letter, the impact of channel width variation on behaviour of the device is studied by means of 3D-TCAD simulation tool. In this matter, the transfer characteristics, energy band diagram (valence/conduction band) and normal electric field along the nanowire between the source and the drain are studied at pinch off state. By decreasing the nanowire width, the on current decreases. Threshold voltage also reduced by decreasing the wire width. The highest electric field occurs at off state and the normal component of the electric field is stronger for smaller channel width. At pinch off state, the energy band diagrams revealed that a potential barrier against the current flow was built in channel which the smallest width has higher potential barrier. The overall result agrees with the behaviour of the nanowire junctionless transistors.
format Conference or Workshop Item
author Dehzangi, Arash
Larki, Farhad
Yeop Majlis, Burhanuddin
Hamidon, Mohd Nizar
N V Visvanathan, P. Susthitha Menon
Jalar @ Jalil, Azman
Islam, Md. Shabiul
Md. Ali, Sawal Hamid
spellingShingle Dehzangi, Arash
Larki, Farhad
Yeop Majlis, Burhanuddin
Hamidon, Mohd Nizar
N V Visvanathan, P. Susthitha Menon
Jalar @ Jalil, Azman
Islam, Md. Shabiul
Md. Ali, Sawal Hamid
Numerical investigation of channel width variation in junctionless transistors performance
author_facet Dehzangi, Arash
Larki, Farhad
Yeop Majlis, Burhanuddin
Hamidon, Mohd Nizar
N V Visvanathan, P. Susthitha Menon
Jalar @ Jalil, Azman
Islam, Md. Shabiul
Md. Ali, Sawal Hamid
author_sort Dehzangi, Arash
title Numerical investigation of channel width variation in junctionless transistors performance
title_short Numerical investigation of channel width variation in junctionless transistors performance
title_full Numerical investigation of channel width variation in junctionless transistors performance
title_fullStr Numerical investigation of channel width variation in junctionless transistors performance
title_full_unstemmed Numerical investigation of channel width variation in junctionless transistors performance
title_sort numerical investigation of channel width variation in junctionless transistors performance
publisher IEEE
publishDate 2013
url http://psasir.upm.edu.my/id/eprint/69155/1/Numerical%20investigation%20of%20channel%20width%20variation%20in%20junctionless%20transistors%20performance.pdf
http://psasir.upm.edu.my/id/eprint/69155/
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score 13.160551