Photo-oxidation studies of 4-(chloromethyl)phenyltrichlorosilane on silicon and titanium oxide

The rates of photo-oxidation of 4-(chloromethyl)phenyltrichlorosilane (CMPS) formed on titanium oxide (TiO2) and silicon oxide (SiO2) substrates were studied. The optimized self-assembly of CMPS films on SiO2 and TiO2 were investigated which subsequently used for comparing photochemical reactions by...

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Bibliographic Details
Main Authors: Ali Sabri, Nadirah, Alang Ahmad, Shahrul Ainliah
Format: Article
Language:English
Published: Asian Publication Corporation 2016
Online Access:http://psasir.upm.edu.my/id/eprint/53566/1/Photo-oxidation%20studies%20of%204-%28chloromethyl%29phenyltrichlorosilane%20on%20silicon%20and%20titanium%20oxide.pdf
http://psasir.upm.edu.my/id/eprint/53566/
https://asianjournalofchemistry.co.in/user/journal/viewarticle.aspx?ArticleID=28_7_25
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