Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source
The electric field due to a strong capacitive coupling between the induction coil and the walls of the plasma chamber is quite large despite the discharge being in the H-mode in N2 and H2 gases. And as such, this field will interfere with the measurement of the magnetic field thus causing a high deg...
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my.uniten.dspace-57482017-12-14T01:25:25Z Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source Chakrabarty, C.K. The electric field due to a strong capacitive coupling between the induction coil and the walls of the plasma chamber is quite large despite the discharge being in the H-mode in N2 and H2 gases. And as such, this field will interfere with the measurement of the magnetic field thus causing a high degree of measurement error. This paper hence describes the use of a centre-tapped coiled magnetic probe for the measurement of magnetic field profiles in 1-D in the low frequency RF inductively coupled plasma source. From these profiles, an independent method to determine the average electron density is also shown. © 2006 Elsevier Ltd. All rights reserved. 2017-12-08T06:45:51Z 2017-12-08T06:45:51Z 2006 Article 10.1016/j.measurement.2006.03.003 en_US Measurement: Journal of the International Measurement Confederation Volume 39, Issue 8, October 2006, Pages 736-739 |
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The electric field due to a strong capacitive coupling between the induction coil and the walls of the plasma chamber is quite large despite the discharge being in the H-mode in N2 and H2 gases. And as such, this field will interfere with the measurement of the magnetic field thus causing a high degree of measurement error. This paper hence describes the use of a centre-tapped coiled magnetic probe for the measurement of magnetic field profiles in 1-D in the low frequency RF inductively coupled plasma source. From these profiles, an independent method to determine the average electron density is also shown. © 2006 Elsevier Ltd. All rights reserved. |
format |
Article |
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Chakrabarty, C.K. |
spellingShingle |
Chakrabarty, C.K. Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source |
author_facet |
Chakrabarty, C.K. |
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Chakrabarty, C.K. |
title |
Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source |
title_short |
Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source |
title_full |
Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source |
title_fullStr |
Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source |
title_full_unstemmed |
Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source |
title_sort |
magnetic field measurements for n2 and h2 discharges from a low frequency rf inductively coupled plasma source |
publishDate |
2017 |
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1644493765919899648 |
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13.214268 |