Ahmad, W. (2017). TCAD simulation of local mechanical stress reduction by use of a compressive silicon nitride/silicon oxynitride etch stop bi-layer for CMOS performance enhancement.
Chicago Style CitationAhmad, W.R.W. TCAD Simulation of Local Mechanical Stress Reduction By Use of a Compressive Silicon Nitride/silicon Oxynitride Etch Stop Bi-layer for CMOS Performance Enhancement. 2017.
MLA CitationAhmad, W.R.W. TCAD Simulation of Local Mechanical Stress Reduction By Use of a Compressive Silicon Nitride/silicon Oxynitride Etch Stop Bi-layer for CMOS Performance Enhancement. 2017.
Warning: These citations may not always be 100% accurate.