APA引文

Maheran, A. (2017). Statistical process modelling for 32nm high-K/metal gate PMOS device.

Chicago Style Citation

Maheran, A.H.A. Statistical Process Modelling for 32nm High-K/metal Gate PMOS Device. 2017.

MLA引文

Maheran, A.H.A. Statistical Process Modelling for 32nm High-K/metal Gate PMOS Device. 2017.

警告：这些引文格式不一定是100％准确.