Optimization of process parameters for Si lateral PIN photodiode

• Main Authors: Menon P.S., Kalthom Tasirin S., Ahmad I., Fazlili Abdullah S.
• Other Authors: 57201289731
• Format: Article
• Published: 2023
• Subjects: Lateral; P-i-n; Photodiode; Silvaco; Simulation; Taguchi method

This paper is about four optimization factors of process parameters, namely the intrinsic region length, photoabsorption layer thickness, the incident optical power and the bias voltage in a Si lateral pin-photodiode so as to obtain high frequency response and responsivity. Optimization of these par...