APA Citation

F., S., & 36239165300. (2023). Influence of HALO and source/drain implantation on threshold voltage in 45nm PMOS device.

Chicago Style Citation

F., Salehuddin, and 36239165300. Influence of HALO and Source/drain Implantation On Threshold Voltage in 45nm PMOS Device. 2023.

MLA Citation

F., Salehuddin, and 36239165300. Influence of HALO and Source/drain Implantation On Threshold Voltage in 45nm PMOS Device. 2023.

Warning: These citations may not always be 100% accurate.