The direction decoupled Quiet Direct Simulation method for rapid simulation of axisymmetric inviscid unsteady flow in pulsed pressure chemical vapour deposition

• 主要な著者: Lim C.W., Smith M.R., Cave H.M., Jermy M.C., Wu J.-S., Krumdieck S.P.
• その他の著者: 35722335000
• フォーマット: 論文
• 出版事項: 2023
• 主題: Forward-facing cylinder; Gas kinetic solver; Numerical dissipation; PP-CVD; QDS; Shock-bubble interaction; Computer simulation; Deposition; Flow fields; Unsteady flow; Vapors; Kinetic solvers; Chemical vapor deposition

Pulsed Pressure-Chemical Vapour Deposition (PP-CVD) is a thin film deposition process which employs a highly unsteady flow with wide dynamic range of pressure. The large, time-varying density gradient during a PP-CVD process cycle produces a flow field in which the Knudsen number varies from the nea...