APA Citation

N., A., & 26422792900. (2023). Influence of Optimization of Process Parameters on Threshold Voltage for Development of HfO2/TiSi2 18 nm PMOS. EDP Sciences.

Chicago Style Citation

N., Atan, and 26422792900. Influence of Optimization of Process Parameters On Threshold Voltage for Development of HfO2/TiSi2 18 Nm PMOS. EDP Sciences, 2023.

MLA Citation

N., Atan, and 26422792900. Influence of Optimization of Process Parameters On Threshold Voltage for Development of HfO2/TiSi2 18 Nm PMOS. EDP Sciences, 2023.

Warning: These citations may not always be 100% accurate.