N., A., & 26422792900. (2023). Influence of Optimization of Process Parameters on Threshold Voltage for Development of HfO2/TiSi2 18 nm PMOS. EDP Sciences.
استشهاد بنمط شيكاغوN., Atan, and 26422792900. Influence of Optimization of Process Parameters On Threshold Voltage for Development of HfO2/TiSi2 18 Nm PMOS. EDP Sciences, 2023.
MLA استشهادN., Atan, and 26422792900. Influence of Optimization of Process Parameters On Threshold Voltage for Development of HfO2/TiSi2 18 Nm PMOS. EDP Sciences, 2023.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.