APA引文

N., A., & 26422792900. (2023). Influence of Optimization of Process Parameters on Threshold Voltage for Development of HfO2/TiSi2 18 nm PMOS. EDP Sciences.

Chicago Style Citation

N., Atan, and 26422792900. Influence of Optimization of Process Parameters On Threshold Voltage for Development of HfO2/TiSi2 18 Nm PMOS. EDP Sciences, 2023.

MLA引文

N., Atan, and 26422792900. Influence of Optimization of Process Parameters On Threshold Voltage for Development of HfO2/TiSi2 18 Nm PMOS. EDP Sciences, 2023.

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