Cover Image

Optimization of line pattern transfer of integrated optical mach-zender interferometer for optical sensor

Master of Science in Microelectronic Engineering

Saved in:
Bibliographic Details
Main Author: Nurulbariah, Idris
Other Authors: Mukhzeer, Mohammad Shahimin, Dr.
Format: Thesis
Language:English
Published: Universiti Malaysia Perlis (UniMAP) 2016
Subjects:
Photolithography
Photoresists
Integrated Optical Mach-Zehnder Interferometer (IO-MZI)
Online Access:http://dspace.unimap.edu.my:80/xmlui/handle/123456789/78345
Tags: Add Tag
No Tags, Be the first to tag this record!
id my.unimap-78345
record_format dspace
spelling my.unimap-783452023-04-17T04:03:18Z Optimization of line pattern transfer of integrated optical mach-zender interferometer for optical sensor Nurulbariah, Idris Mukhzeer, Mohammad Shahimin, Dr. Photolithography Photoresists Integrated Optical Mach-Zehnder Interferometer (IO-MZI) Master of Science in Microelectronic Engineering Conventional photolithography usually used in in-house fabrication process to transfer the design of line pattern. This research lays the foundation for the optimization of photo lithography process for line pattern transfer of complex optical circuitry. Integrated Optical Mach-Zehnder Interferometer (IO-MZI) has been widely used for biosensor applications. In order to have a significant advantage in improving the sensitivity of the biosensor, it is crucial to get a good, consistent and conformal line pattern transfer with a fine width; in our case is approximately 4μm and 3cm length. However, the success rate of 10-MZI pattern transfer had been low using the conventional multi-development process. One of the main factors is the particle contamination due to the usage of reused developer bath. In this work, an innovative single development process had been proposed with the utilization of the same conventional set-up. The concept of this method centers around the optimization of the total development time based on the experimental and mathematical model of the development rate. By doing so, the development process can be completed with only one immersion of the substrate in the developer bath. Due to this reason, the aim of this project is to improve the success rate and repeatability of photolithography process without compromising the resolution and vertical profile, which is necessary for the optical waveguide fabrication. Besides, the manipulation of development rate by varying exposure time in this work also revealed the possibility of manipulation of linewidth based on the exposure time. In short, the proposed single development process had increased the success rate of 10-MZI pattern transfer from 300/o (multi-development method) to 90% (single-development method). The characterization of in-house single development fabrication process has improved the current photolithography setup for line pattern transfer and complex design pattern transfer. 2016 2023-04-17T03:57:58Z 2023-04-17T03:57:58Z Thesis http://dspace.unimap.edu.my:80/xmlui/handle/123456789/78345 en Universiti Malaysia Perlis (UniMAP) Universiti Malaysia Perlis (UniMAP) School of Microelectronic Engineering
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Photolithography
Photoresists
Integrated Optical Mach-Zehnder Interferometer (IO-MZI)
spellingShingle Photolithography
Photoresists
Integrated Optical Mach-Zehnder Interferometer (IO-MZI)
Nurulbariah, Idris
Optimization of line pattern transfer of integrated optical mach-zender interferometer for optical sensor
description Master of Science in Microelectronic Engineering
author2 Mukhzeer, Mohammad Shahimin, Dr.
author_facet Mukhzeer, Mohammad Shahimin, Dr.
Nurulbariah, Idris
format Thesis
author Nurulbariah, Idris
author_sort Nurulbariah, Idris
title Optimization of line pattern transfer of integrated optical mach-zender interferometer for optical sensor
title_short Optimization of line pattern transfer of integrated optical mach-zender interferometer for optical sensor
title_full Optimization of line pattern transfer of integrated optical mach-zender interferometer for optical sensor
title_fullStr Optimization of line pattern transfer of integrated optical mach-zender interferometer for optical sensor
title_full_unstemmed Optimization of line pattern transfer of integrated optical mach-zender interferometer for optical sensor
title_sort optimization of line pattern transfer of integrated optical mach-zender interferometer for optical sensor
publisher Universiti Malaysia Perlis (UniMAP)
publishDate 2016
url http://dspace.unimap.edu.my:80/xmlui/handle/123456789/78345
_version_ 1772813157987778560
score 13.222552

Similar Items