A., D., & a.dhongde.1@research.gla.ac.uk. (2022). The role of selective pattern etching to improve the Ohmic contact resistance and device performance of AlGaN/GaN HEMTs. Universiti Malaysia Perlis (UniMAP).
Chicago Style CitationA., Dhongde, and a.dhongde.1@research.gla.ac.uk. The Role of Selective Pattern Etching to Improve the Ohmic Contact Resistance and Device Performance of AlGaN/GaN HEMTs. Universiti Malaysia Perlis (UniMAP), 2022.
MLA CitationA., Dhongde, and a.dhongde.1@research.gla.ac.uk. The Role of Selective Pattern Etching to Improve the Ohmic Contact Resistance and Device Performance of AlGaN/GaN HEMTs. Universiti Malaysia Perlis (UniMAP), 2022.
Warning: These citations may not always be 100% accurate.