Cover Image

Ion implantation process of Lanthanum and Titanium Dopants into a substrate of FE80 CR20

Organized by School of Materials Engineering & Sustainable Engineering Research Cluster, 1st - 2nd December 2009 at Putra Brasmana Hotel, Kuala Perlis, Perlis.

Saved in:
Bibliographic Details
Main Authors: Hendi, Saryanto, Darwin, Sebayang, Pudji, Untoro, Tjipto, Sujitno
Other Authors: darwin@uthm.edu.my
Format: Working Paper
Language:English
Published: Universiti Malaysia Perlis 2010
Subjects:
Ion Implantation
Microstructure
Micro Hardness
SEM
EDX
Lanthanum
Materials engineering
Online Access:http://dspace.unimap.edu.my/xmlui/handle/123456789/7473
Tags: Add Tag
No Tags, Be the first to tag this record!
id my.unimap-7473
record_format dspace
spelling my.unimap-74732010-01-12T01:14:07Z Ion implantation process of Lanthanum and Titanium Dopants into a substrate of FE80 CR20 Hendi, Saryanto Darwin, Sebayang Pudji, Untoro Tjipto, Sujitno darwin@uthm.edu.my Ion Implantation Microstructure Micro Hardness SEM EDX Lanthanum Materials engineering Organized by School of Materials Engineering & Sustainable Engineering Research Cluster, 1st - 2nd December 2009 at Putra Brasmana Hotel, Kuala Perlis, Perlis. Ion implantation is the process of depositing a chemical species into a substrate by direct bombardment of the substrate with high-energy ion in such away the changing of physical properties of the solid species, therefore, taken place. The aim of this research is to show the ion implantation process into a substrate Fe80Cr20 with Lanthanum and Titanium dopants. Specimens, Fe80Cr20 were developed using powder metallurgy technique, Lanthanum and Titanium ions were implanted by using Cockcroft-Walton Type 200 keV/200 μA ion implantor with ion doses of 1017 ions/cm2 and kinetics energy 100 keV. The prediction of thin layer of dopants into surface of Fe80Cr20 was performed using a software called TRIM-SRIM simulation tools. The micro hardness test was conducted by the Vickers-micro hardness tester, and the characterization of microstructure was carried out by EDX, and SEM. The ion implantation process was succeeded to deposit the Lanthanum and Titanium dopants into the surface of Fe80Cr20. Predictive models for the effects of post-implantation processing, such as micro hardness, are also discussed in this paper. 2010-01-11T05:05:40Z 2010-01-11T05:05:40Z 2009-12-01 Working Paper p. http://hdl.handle.net/123456789/7473 en Proceedings of the Malaysian Metallurgical Conference '09 (MMC'09) Universiti Malaysia Perlis
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Ion Implantation
Microstructure
Micro Hardness
SEM
EDX
Lanthanum
Materials engineering
spellingShingle Ion Implantation
Microstructure
Micro Hardness
SEM
EDX
Lanthanum
Materials engineering
Hendi, Saryanto
Darwin, Sebayang
Pudji, Untoro
Tjipto, Sujitno
Ion implantation process of Lanthanum and Titanium Dopants into a substrate of FE80 CR20
description Organized by School of Materials Engineering & Sustainable Engineering Research Cluster, 1st - 2nd December 2009 at Putra Brasmana Hotel, Kuala Perlis, Perlis.
author2 darwin@uthm.edu.my
author_facet darwin@uthm.edu.my
Hendi, Saryanto
Darwin, Sebayang
Pudji, Untoro
Tjipto, Sujitno
format Working Paper
author Hendi, Saryanto
Darwin, Sebayang
Pudji, Untoro
Tjipto, Sujitno
author_sort Hendi, Saryanto
title Ion implantation process of Lanthanum and Titanium Dopants into a substrate of FE80 CR20
title_short Ion implantation process of Lanthanum and Titanium Dopants into a substrate of FE80 CR20
title_full Ion implantation process of Lanthanum and Titanium Dopants into a substrate of FE80 CR20
title_fullStr Ion implantation process of Lanthanum and Titanium Dopants into a substrate of FE80 CR20
title_full_unstemmed Ion implantation process of Lanthanum and Titanium Dopants into a substrate of FE80 CR20
title_sort ion implantation process of lanthanum and titanium dopants into a substrate of fe80 cr20
publisher Universiti Malaysia Perlis
publishDate 2010
url http://dspace.unimap.edu.my/xmlui/handle/123456789/7473
_version_ 1643788833412612096
score 13.214268

Similar Items