Electrodeposited ZnO-nanowire/Cu2O photovoltaic device with highly resistive ZnO intermediate layer

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Main Authors: Mohd Zamzuri, Mohammad Zain, Masanobu, Izaki, Ohta, Takayuki, Kondo, Misaki, Takahashi, Toshiaki, Fariza, Mohamad, Junji, Sasano, Shinagawa, Tsutomu, Pauporté, Thierry
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Language:English
Published: American Chemical Society 2019
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Online Access:http://dspace.unimap.edu.my:80/xmlui/handle/123456789/61801
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spelling my.unimap-618012019-09-11T04:17:34Z Electrodeposited ZnO-nanowire/Cu2O photovoltaic device with highly resistive ZnO intermediate layer Mohd Zamzuri, Mohammad Zain Masanobu, Izaki Ohta, Takayuki Kondo, Misaki Takahashi, Toshiaki Fariza, Mohamad Junji, Sasano Shinagawa, Tsutomu Pauporté, Thierry Cuprous oxide Zinc oxide Electrodeposition Photovoltaic device Nanowire Link to publisher's homepage at http://pubs.acs.org Cl-doped ZnO-nanowire (Cl:ZnO-nws)/Cu2O photovoltaic devices were prepared by electrodeposition in aqueous solutions, and the effects of the insertion of the highly resistive ZnO (i-ZnO) layer has been demonstrated by an improvement of the photovoltaic performance. The Cl:ZnO-nws and i-ZnO layer were prepared by electrodeposition in a zinc chloride aqueous solution with saturated molecular oxygen and simple zinc nitrate aqueous solution, respectively. The i-ZnO layer was directly deposited on the Cl:ZnO-nws and suppressed the electrodeposition of the Cu2O layer on the Cl:ZnO-nws. The insertion of the i-ZnO layer between the Cl:ZnO-nws and Cu2O layers induced an improvement in the photovoltaic performance from 0.40 to 1.26% with a 0.35 V open circuit voltage, 7.1 mA•cm-2 short circuit current density, and 0.52 fill factor due to the reduction of the recombination loss. 2019-09-11T04:16:50Z 2019-09-11T04:16:50Z 2014-07 Article ACS Applied Materials and Interfaces, Vol.6 (16), 2014, pages 13461-13469 1944-8244 (print) 1944-8252 (online) http://dspace.unimap.edu.my:80/xmlui/handle/123456789/61801 https://pubs.acs.org/doi/abs/10.1021/am502246j en American Chemical Society
institution Universiti Malaysia Perlis
building UniMAP Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaysia Perlis
content_source UniMAP Library Digital Repository
url_provider http://dspace.unimap.edu.my/
language English
topic Cuprous oxide
Zinc oxide
Electrodeposition
Photovoltaic device
Nanowire
spellingShingle Cuprous oxide
Zinc oxide
Electrodeposition
Photovoltaic device
Nanowire
Mohd Zamzuri, Mohammad Zain
Masanobu, Izaki
Ohta, Takayuki
Kondo, Misaki
Takahashi, Toshiaki
Fariza, Mohamad
Junji, Sasano
Shinagawa, Tsutomu
Pauporté, Thierry
Electrodeposited ZnO-nanowire/Cu2O photovoltaic device with highly resistive ZnO intermediate layer
description Link to publisher's homepage at http://pubs.acs.org
format Article
author Mohd Zamzuri, Mohammad Zain
Masanobu, Izaki
Ohta, Takayuki
Kondo, Misaki
Takahashi, Toshiaki
Fariza, Mohamad
Junji, Sasano
Shinagawa, Tsutomu
Pauporté, Thierry
author_facet Mohd Zamzuri, Mohammad Zain
Masanobu, Izaki
Ohta, Takayuki
Kondo, Misaki
Takahashi, Toshiaki
Fariza, Mohamad
Junji, Sasano
Shinagawa, Tsutomu
Pauporté, Thierry
author_sort Mohd Zamzuri, Mohammad Zain
title Electrodeposited ZnO-nanowire/Cu2O photovoltaic device with highly resistive ZnO intermediate layer
title_short Electrodeposited ZnO-nanowire/Cu2O photovoltaic device with highly resistive ZnO intermediate layer
title_full Electrodeposited ZnO-nanowire/Cu2O photovoltaic device with highly resistive ZnO intermediate layer
title_fullStr Electrodeposited ZnO-nanowire/Cu2O photovoltaic device with highly resistive ZnO intermediate layer
title_full_unstemmed Electrodeposited ZnO-nanowire/Cu2O photovoltaic device with highly resistive ZnO intermediate layer
title_sort electrodeposited zno-nanowire/cu2o photovoltaic device with highly resistive zno intermediate layer
publisher American Chemical Society
publishDate 2019
url http://dspace.unimap.edu.my:80/xmlui/handle/123456789/61801
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score 13.214268