Retnasamy, V., & vc.sundress@gmail.com. (2014). Wettability analysis on platinum deposited wafer after reactive ion ecthing using SF6+argon/CF4+argon gaseous. AENSI Publisher All rights reserved.
استشهاد بنمط شيكاغوRetnasamy, Vithyacharan, and vc.sundress@gmail.com. Wettability Analysis On Platinum Deposited Wafer After Reactive Ion Ecthing Using SF6+argon/CF4+argon Gaseous. AENSI Publisher All rights reserved, 2014.
MLA استشهادRetnasamy, Vithyacharan, and vc.sundress@gmail.com. Wettability Analysis On Platinum Deposited Wafer After Reactive Ion Ecthing Using SF6+argon/CF4+argon Gaseous. AENSI Publisher All rights reserved, 2014.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.