Fabrication and characterization of a-Si micro and nano-gap structure for electrochemical sensor
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2012
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my.unimap-188872012-04-22T02:02:01Z Fabrication and characterization of a-Si micro and nano-gap structure for electrochemical sensor Th Sabar, Dhahi Uda, Hashim, Prof. Dr. N. M., Ahmed Md Eaqub, Ali Capacitance-Voltage Measurement Conductivity Micro and Nano-Gap UV Lithography Link to publisher's homepage at http://proceedings.aip.org/ The development and application of micro gap for electrochemical sensors and biomolecule detection are reviewed in this article. The preparation methods for micro- and nano-gaps and their properties are discussed along with their advantages in electrochemical sensors and biomolecule detection. Biology and medicine have seen great advances in biosensors and biochips capable of characterizing and quantifying electrochemical sensor. To understand the important relationship between sensibility and nano structure, we introduce the fabrication and characterization of micro- and nano-gap structures for electrochemical sensor. In this paper, two mask designs are proposed. The first is the lateral micro- and nano-gap with aluminum (Al) electrode, and the second mask is for pad Al electrode pattern. Lateral micro-gaps are introduced in the fabrication process using amorphous silicon (a-Si) and Al as an electrode. Conventional ultraviolet lithography technique and dry etching for a-Si layer with wet etching for Al surface processes are used to fabricate the micro- and nano-gaps based on the standard complementary metal-oxide-semiconductor technology and characterization of its conductivity. Electrical characterization is applied using Semiconductor Parameter Analyzer, Spectrum Analyzer, current-voltage (IV)-capacitance-voltage (CV) station for electrical characteristics. Conductivity, resistance, and capacitance tests are performed to characterize and verify the structure of the device, resulting in a small micro-gap as revealed by a further IV curve result showing a current in nano amps. The characteristics of the fabricated gap are close to those of a micro-gap, as verified by the literature. 2012-04-22T02:02:01Z 2012-04-22T02:02:01Z 2010-12-01 Working Paper p. 277-282 978-0-7354-0897-5 0094-243X http://proceedings.aip.org/resource/2/apcpcs/1341/1/277_1?isAuthorized=no http://hdl.handle.net/123456789/18887 en Proceedings of the International Conference on Enabling Science and Nanotechnology (EsciNano) 2010 American Institute of Physics |
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Capacitance-Voltage Measurement Conductivity Micro and Nano-Gap UV Lithography |
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Capacitance-Voltage Measurement Conductivity Micro and Nano-Gap UV Lithography Th Sabar, Dhahi Uda, Hashim, Prof. Dr. N. M., Ahmed Md Eaqub, Ali Fabrication and characterization of a-Si micro and nano-gap structure for electrochemical sensor |
description |
Link to publisher's homepage at http://proceedings.aip.org/ |
format |
Working Paper |
author |
Th Sabar, Dhahi Uda, Hashim, Prof. Dr. N. M., Ahmed Md Eaqub, Ali |
author_facet |
Th Sabar, Dhahi Uda, Hashim, Prof. Dr. N. M., Ahmed Md Eaqub, Ali |
author_sort |
Th Sabar, Dhahi |
title |
Fabrication and characterization of a-Si micro and nano-gap structure for electrochemical sensor |
title_short |
Fabrication and characterization of a-Si micro and nano-gap structure for electrochemical sensor |
title_full |
Fabrication and characterization of a-Si micro and nano-gap structure for electrochemical sensor |
title_fullStr |
Fabrication and characterization of a-Si micro and nano-gap structure for electrochemical sensor |
title_full_unstemmed |
Fabrication and characterization of a-Si micro and nano-gap structure for electrochemical sensor |
title_sort |
fabrication and characterization of a-si micro and nano-gap structure for electrochemical sensor |
publisher |
American Institute of Physics |
publishDate |
2012 |
url |
http://dspace.unimap.edu.my/xmlui/handle/123456789/18887 |
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1643792573204004864 |
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13.214268 |