Photo-polishing of palm oil mill effluent (POME) over UV/ZnO system

• Main Authors: Ng, K. H., Cheng, C. K.
• Format: Conference or Workshop Item
• Language: English
• Published: 2016
• Subjects: TP Chemical technology
• Online Access: http://umpir.ump.edu.my/id/eprint/17069/1/Photo-polishing%20of%20Palm%20Oil%20Mill%20Effluent%20%28POME%29%20over%20UVZnO%20System.pdf; http://umpir.ump.edu.my/id/eprint/17069/

The photo-polishing of POME over UV /'ZnO photocatalysis system was performed in current study. The ZnO material, with band gap energy of 3.2 eV from our UV-Vis DRS measurement, was proven responsive towards 100 W UV-irradiation of 365 nm wavelength. The effect of ZnO loading was investigated Based on the results obtained, the optimum ZnO loading for POME photomineralization was 1.0 g/L, with about 50% of COD removal recorded after 240 min of UV irradiation. It is found that all the photomineralization kinetics for all the photoreaction followed the 1st-order reaction with specific reaction rates (k) ranging froml.022 x10-3 to 3.118 x10-3 min-1 • Significantly, the organic removal efficiency was further enhanced when UV exposure was prolonged to 22 h, attaining final readings of 44 ppm of chemical oxygen demand (COD) level.