Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partialfilling Ultraviolet Nanoimprint Lithography

• Main Authors: Nurhafizah, Abu Talip, Hayashi, Tatsuya, Taniguchi, Jun, Hiwasa, Shin
• Format: Conference or Workshop Item
• Language: English
• Published: 2015
• Subjects: TK Electrical engineering. Electronics Nuclear engineering
• Online Access: http://umpir.ump.edu.my/id/eprint/10471/1/Lifetime%20Prolongation%20of%20Release%20Agent%20on%20Antireflection%20Structure%20Molds%20by%20Means%20of%20Partialfilling%20Ultraviolet%20Nanoimprint%20Lithography.pdf; http://umpir.ump.edu.my/id/eprint/10471/; http://dx.doi.org/10.1109/ICEP-IAAC.2015.7111048

Release agent becomes an imperative element in ultraviolet nanoimprint lithography (UV-NIL) for preventing the adhesive resin from adhering to the surface of antireflection structures (ARS) mold. However, complete filling the resin of a high-aspect-ratio ARS mold during UV-NIL generates a strong rel...