Probing technique for energy distribution of positive charges in gate dielectrics and its application to lifetime prediction / Sharifah Fatmadiana Wan Muhamad Hatta
The continuous reduction of the dimensions of CMOS devices has increased the negative bias temperature instability (NBTI) of pMOSFETs to such a level that it is limiting their lifetime. This increase of NBTI is caused mainly by three factors: an increase of nitrogen concentration in gate dielectric,...
Saved in:
Main Author: | |
---|---|
Format: | Thesis |
Published: |
2013
|
Subjects: | |
Online Access: | http://studentsrepo.um.edu.my/8287/5/Thesis_SharifahFatmadiana_Dec_2013.pdf http://studentsrepo.um.edu.my/8287/ |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Be the first to leave a comment!