Inductively coupled plasma dry etching process on planar lightwave circuit fabrication / Chuah Khoon Seah
The main objective of this project is to master state-of-the-art techniques and knowledge in silica etching in order to achieve high quality waveguide circuit on Planar Lightwave Circuit devices. Another objective is to optimize the clean room research strength, surface characterization, microscopy...
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| Format: | Thesis |
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2010
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| Online Access: | http://studentsrepo.um.edu.my/4273/1/Complete_MSc_Thesis_2010_KSChuah.pdf http://pendeta.um.edu.my/client/default/search/detailnonmodal/ent:$002f$002fSD_ILS$002f796$002fSD_ILS:796879/one?qu=Inductively+coupled+plasma+dry+etching+process+on+planar+lightwave http://studentsrepo.um.edu.my/4273/ |
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http://studentsrepo.um.edu.my/4273/1/Complete_MSc_Thesis_2010_KSChuah.pdfhttp://pendeta.um.edu.my/client/default/search/detailnonmodal/ent:$002f$002fSD_ILS$002f796$002fSD_ILS:796879/one?qu=Inductively+coupled+plasma+dry+etching+process+on+planar+lightwave
http://studentsrepo.um.edu.my/4273/