Effect of energetic ion beam irradiation on structural and optical properties of a-Si:H thin films

Hydrogenated amorphous silicon (a-Si:H) thin films deposited by radio-frequency plasma enhanced chemical vapor deposition were irradiated by an energetic argon ion beam source from a 3.3 kJ Mather type dense plasma focus device. The effect of the energetic ion beam irradiation on the structural and...

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Bibliographic Details
Main Authors: Goh, Boon Tong, Ngoi, Siew Kien, Yap, S.L., Wong, C.S., Rahman, Saadah Abdul
Format: Article
Published: 2013
Subjects:
Online Access:http://eprints.um.edu.my/7333/
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