Review-gate oxide thin films based on silicon carbide
A comprehensive review of the features of silicon carbide (SiC) and various methods of deposition of gate oxides are presented in this report. The SiC material, which is mostly employed as base component in metal oxide semiconductor field effect transistors (MOSFETs) is very promising; for its high...
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Main Authors: | , , , , |
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Format: | Article |
Published: |
Electrochemical Soc Inc
2022
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Online Access: | http://eprints.um.edu.my/41567/ |
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