Effect of Plasma Treatment (He/CH4) on the Glass Surface for the Reduction of Powder Flux Adhesion in the Spray Drying Process

A 50Hz glow discharge He/CH4 plasma was generated and applied for the glass surface modification to reduce the powder adhesion on wall of spray dryer. The hydrophobicity of the samples determined by the water droplet contact angle and adhesion weight on glass, dependent on the CH4 flow rate and plas...

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Main Authors: Ramlan, Nadiah, Mohd Zamri, Nazirah Wahidah, Maskat, Mohamad Yusof, Md Jamil, Mohd Suzeren, Chin, Oi Hoong, Lau, Yen Theng, Zubairi, Saiful Irwan
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Published: Penerbit Universiti Kebangsaan Malaysia 2018
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Online Access:http://eprints.um.edu.my/20926/
https://doi.org/10.17576/jsm-2018-4706-10
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spelling my.um.eprints.209262019-04-16T03:40:56Z http://eprints.um.edu.my/20926/ Effect of Plasma Treatment (He/CH4) on the Glass Surface for the Reduction of Powder Flux Adhesion in the Spray Drying Process Ramlan, Nadiah Mohd Zamri, Nazirah Wahidah Maskat, Mohamad Yusof Md Jamil, Mohd Suzeren Chin, Oi Hoong Lau, Yen Theng Zubairi, Saiful Irwan Q Science (General) QC Physics A 50Hz glow discharge He/CH4 plasma was generated and applied for the glass surface modification to reduce the powder adhesion on wall of spray dryer. The hydrophobicity of the samples determined by the water droplet contact angle and adhesion weight on glass, dependent on the CH4 flow rate and plasma exposure time. The presence of CH3 groups and higher surface roughness of the plasma treated glass were the factors for its hydrophobicity development. Response surface methodology (RSM) results using central composite rotatable design (CCRD) showed that optimal responses were obtained by the combination of parameters, CH4 gas flow rate = 3 sccm and exposure time = 10 min. In optimum conditions, the contact angle increased by 47% and the weight of the adhesion reduced by 38% (w/w). The plasma treatment could enhance the value of the contact angle and thus reduced the adhesion on the spray dryer glass surface. Penerbit Universiti Kebangsaan Malaysia 2018 Article PeerReviewed Ramlan, Nadiah and Mohd Zamri, Nazirah Wahidah and Maskat, Mohamad Yusof and Md Jamil, Mohd Suzeren and Chin, Oi Hoong and Lau, Yen Theng and Zubairi, Saiful Irwan (2018) Effect of Plasma Treatment (He/CH4) on the Glass Surface for the Reduction of Powder Flux Adhesion in the Spray Drying Process. Sains Malaysiana, 47 (6). pp. 1147-1155. ISSN 0126-6039 https://doi.org/10.17576/jsm-2018-4706-10 doi:10.17576/jsm-2018-4706-10
institution Universiti Malaya
building UM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider Universiti Malaya
content_source UM Research Repository
url_provider http://eprints.um.edu.my/
topic Q Science (General)
QC Physics
spellingShingle Q Science (General)
QC Physics
Ramlan, Nadiah
Mohd Zamri, Nazirah Wahidah
Maskat, Mohamad Yusof
Md Jamil, Mohd Suzeren
Chin, Oi Hoong
Lau, Yen Theng
Zubairi, Saiful Irwan
Effect of Plasma Treatment (He/CH4) on the Glass Surface for the Reduction of Powder Flux Adhesion in the Spray Drying Process
description A 50Hz glow discharge He/CH4 plasma was generated and applied for the glass surface modification to reduce the powder adhesion on wall of spray dryer. The hydrophobicity of the samples determined by the water droplet contact angle and adhesion weight on glass, dependent on the CH4 flow rate and plasma exposure time. The presence of CH3 groups and higher surface roughness of the plasma treated glass were the factors for its hydrophobicity development. Response surface methodology (RSM) results using central composite rotatable design (CCRD) showed that optimal responses were obtained by the combination of parameters, CH4 gas flow rate = 3 sccm and exposure time = 10 min. In optimum conditions, the contact angle increased by 47% and the weight of the adhesion reduced by 38% (w/w). The plasma treatment could enhance the value of the contact angle and thus reduced the adhesion on the spray dryer glass surface.
format Article
author Ramlan, Nadiah
Mohd Zamri, Nazirah Wahidah
Maskat, Mohamad Yusof
Md Jamil, Mohd Suzeren
Chin, Oi Hoong
Lau, Yen Theng
Zubairi, Saiful Irwan
author_facet Ramlan, Nadiah
Mohd Zamri, Nazirah Wahidah
Maskat, Mohamad Yusof
Md Jamil, Mohd Suzeren
Chin, Oi Hoong
Lau, Yen Theng
Zubairi, Saiful Irwan
author_sort Ramlan, Nadiah
title Effect of Plasma Treatment (He/CH4) on the Glass Surface for the Reduction of Powder Flux Adhesion in the Spray Drying Process
title_short Effect of Plasma Treatment (He/CH4) on the Glass Surface for the Reduction of Powder Flux Adhesion in the Spray Drying Process
title_full Effect of Plasma Treatment (He/CH4) on the Glass Surface for the Reduction of Powder Flux Adhesion in the Spray Drying Process
title_fullStr Effect of Plasma Treatment (He/CH4) on the Glass Surface for the Reduction of Powder Flux Adhesion in the Spray Drying Process
title_full_unstemmed Effect of Plasma Treatment (He/CH4) on the Glass Surface for the Reduction of Powder Flux Adhesion in the Spray Drying Process
title_sort effect of plasma treatment (he/ch4) on the glass surface for the reduction of powder flux adhesion in the spray drying process
publisher Penerbit Universiti Kebangsaan Malaysia
publishDate 2018
url http://eprints.um.edu.my/20926/
https://doi.org/10.17576/jsm-2018-4706-10
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score 13.209306