Au/nc-Si:H core–shell nanostructures prepared by hot wire assisted plasma enhanced chemical vapor deposition technique
In this study, Au film was embedded in Si:H film on quartz substrate with and without an SiOx layer by using the hot wire assisted plasma enhanced chemical vapor deposition (HW-PECVD) technique. The as-prepared Au/Si:H films were post-thermally annealed at 800 °C in nitrogen ambient in order to in...
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| 主要な著者: | , , , |
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| フォーマット: | 論文 |
| 言語: | English |
| 出版事項: |
Elsevier
2012
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| 主題: | |
| オンライン･アクセス: | http://eprints.um.edu.my/10637/1/00006469_91281.pdf http://eprints.um.edu.my/10637/ |
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| 要約: | In this study, Au film was embedded in Si:H film on quartz substrate with and without an SiOx layer by using
the hot wire assisted plasma enhanced chemical vapor deposition (HW-PECVD) technique. The as-prepared
Au/Si:H films were post-thermally annealed at 800 °C in nitrogen ambient in order to initiate the growth of Au NPs. The annealed Au/a-Si:H film deposited on quartz substrate without an SiOx layer showed the formation of well-distributed and spherical Au NPs. Formations of Au/nc-Si:H core shell nanostructures were observed on annealed film deposited on quartz substrate with an SiOx layer. XRD and micro-Raman scattering spectra revealed that the degree of crystallinity of nc-Si:H was dependent on the annealing temperature and interaction between a-Si:H film and SiOx layer. Optical spectra showed that the Au NPs on
annealed films deposited on quartz substrate without an SiOx layer exhibited prominent SPR peak while annealed Au/nc-Si:H core shell nanostructures showed increased reflectance of light in the visible region. |
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