Au/nc-Si:H core–shell nanostructures prepared by hot wire assisted plasma enhanced chemical vapor deposition technique

In this study, Au film was embedded in Si:H film on quartz substrate with and without an SiOx layer by using the hot wire assisted plasma enhanced chemical vapor deposition (HW-PECVD) technique. The as-prepared Au/Si:H films were post-thermally annealed at 800 °C in nitrogen ambient in order to in...

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Bibliographic Details
Main Authors: Chan, K.W., Goh, Boon Tong, Abdul Rahman, S., Aspanut, Zarina
Format: Article
Language:English
Published: Elsevier 2012
Subjects:
Online Access:http://eprints.um.edu.my/10637/1/00006469_91281.pdf
http://eprints.um.edu.my/10637/
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