The effects of UV light on the polymerization of photoresist / Husna Ahmad Tarmizi
In this study, the p-type and n-type silicon wafer is coated with positive photoresist. Both coating process is using spin on photoresist. The effects of UV light exposure and etching time is studied between thin and thick photoresist thickness on both type of silicon wafer. The photoresist thicknes...
Saved in:
| Main Author: | |
|---|---|
| Format: | Student Project |
| Language: | English |
| Published: |
2012
|
| Subjects: | |
| Online Access: | https://ir.uitm.edu.my/id/eprint/46830/1/46830.pdf https://ir.uitm.edu.my/id/eprint/46830/ |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|