Novel nanofabrication process of oxide patterns using AFM in low operating temperature: a promising lithographic tool for future molecular electronics

• Main Authors: Sutjipto, Agus Geter Edy, -, Afzeri, Muhida, Riza, Mridha, Shahjahan
• Format: Conference or Workshop Item
• Language: English
• Published: 2007
• Subjects: TK452 Electric apparatus and materials. Electric circuits. Electric networks
• Online Access: http://irep.iium.edu.my/9447/1/AGUS_-_Proc_ICEEI-2007.pdf; http://irep.iium.edu.my/9447/

Field-induced oxidation has become a promising process that is capable of directly producing high-resolution surface oxide patterns on variety materials. In this report, a low temperature operation of an atomic force microscope (AFM) was used to condense ambient humidity to perform a thin frozen water layer covering a silicon wafer surface. A scanning probe was contacted with the layer and a zero bias voltage was applied to the probe tip. The frozen water film acted both as an electrolyte for forming the oxides and as a resource of hydroxide. Using this technique, a consistency in height of about 6 nm silicon dioxide patterns layer could be achieved.