Design and fabrication stable LNF contact for future IC application

Enable the design of a small contact spring for applications requiring high density, high speed and high durability. A low normal force (LNF) contact spring with high performance is fabricated using a unique combined MEMS photo resist lithography and electro fine forming (EFF) technology. Reducing a...

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Bibliographic Details
Main Authors: Bhuiyan, Moinul, Rashid, Muhammad Mahbubur, Ahmed, Sayem, Bhuiyan, Munira, Kajihara, Masanori
Format: Article
Language:English
Published: IOP Publishing 2013
Subjects:
Online Access:http://irep.iium.edu.my/34439/1/Design_and_fabrication_stable_LNF_contact_for_future_IC_application.pdf
http://irep.iium.edu.my/34439/
http://iopscience.iop.org/1757-899X/53/1/012060
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