Microstructural characterization of Au-In Thin film deposited by electron beam evaporation
The microstructure and phase formation of Au-In thin film deposited by e-beam evaporation technique has been studied. Single crystals of rocksalt were used as the substrates. The chamber pressure during deposition was about 2.5 10-5 torr and substrate temperature was 35ºC. Three types of samples...
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Main Authors: | , , |
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Format: | Article |
Language: | English |
Published: |
Universiti Kebangsaan Malaysia
2009
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Online Access: | http://journalarticle.ukm.my/62/1/ http://journalarticle.ukm.my/62/ http://www.ukm.my/~jsm/utama.html |
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Summary: | The microstructure and phase formation of Au-In thin film deposited by e-beam evaporation technique has been studied.
Single crystals of rocksalt were used as the substrates. The chamber pressure during deposition was about 2.5 10-5 torr
and substrate temperature was 35ºC. Three types of samples were prepared namely Au, In and Au-In thin films.
Microstructure and chemical composition of these thin films were characterized by transmission electron microscopy
(TEM) and X-ray photoelectron spectrometer (XPS) respectively. TEM micrograph reveals island structures for both Au and
In thin film on the rocksalt substrate, with the In island size distribution is about 9-30 nm compared to Au island in the
range of 3-10 nm. The growth of islands instead of smooth film indicates that Au and In thin films follow the Volmer-
Weber growth mode. However, island structures were not present on Au-In thin films which most probably follow the
Frank van de Merwe growth mode. XPS analysis indicates intermetallic compound was not present in the Au-In thin film
suggesting that diffusion process in the interface of Au and In films is minimal. |
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