Characterization of nickel lead sulphide thin films: X-Ray diffraction studies

In this work, nickel lead sulphide thin films were grown by inexpensive and simple method, namely chemical bath deposition technique. Nickel sulphate, sodium thiosulfate and lead nitrate as the sources of Ni2+, S2- and Pb2+ ions, respectively. The effect of deposition period will be studied from 8...

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Main Author: Ho, Soon Min
Format: Article
Language:English
Published: Asian Research Publishing Network 2017
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Online Access:http://eprints.intimal.edu.my/958/1/Characterization%20of%20nickel%20lead%20sulphide%20thin%20films%20X-Ray%20diffraction%20studies.pdf
http://eprints.intimal.edu.my/958/
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spelling my-inti-eprints.9582017-11-16T06:12:09Z http://eprints.intimal.edu.my/958/ Characterization of nickel lead sulphide thin films: X-Ray diffraction studies Ho, Soon Min TA Engineering (General). Civil engineering (General) In this work, nickel lead sulphide thin films were grown by inexpensive and simple method, namely chemical bath deposition technique. Nickel sulphate, sodium thiosulfate and lead nitrate as the sources of Ni2+, S2- and Pb2+ ions, respectively. The effect of deposition period will be studied from 8 to 34 hours at room temperature. The obtained films were characterized by X-ray diffraction. The results reveal that the number of peaks was increased from two to five peaks as the deposition time increased up to 34 hours. In other words, more materials will be deposited onto substrates for longer deposition time. Asian Research Publishing Network 2017 Article PeerReviewed text en http://eprints.intimal.edu.my/958/1/Characterization%20of%20nickel%20lead%20sulphide%20thin%20films%20X-Ray%20diffraction%20studies.pdf Ho, Soon Min (2017) Characterization of nickel lead sulphide thin films: X-Ray diffraction studies. ARPN Journal of Engineering and Applied Sciences, 12 (15). pp. 4378-4382. ISSN 1819-6608
institution INTI International University
building INTI Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider INTI International University
content_source INTI Institutional Repository
url_provider http://eprints.intimal.edu.my
language English
topic TA Engineering (General). Civil engineering (General)
spellingShingle TA Engineering (General). Civil engineering (General)
Ho, Soon Min
Characterization of nickel lead sulphide thin films: X-Ray diffraction studies
description In this work, nickel lead sulphide thin films were grown by inexpensive and simple method, namely chemical bath deposition technique. Nickel sulphate, sodium thiosulfate and lead nitrate as the sources of Ni2+, S2- and Pb2+ ions, respectively. The effect of deposition period will be studied from 8 to 34 hours at room temperature. The obtained films were characterized by X-ray diffraction. The results reveal that the number of peaks was increased from two to five peaks as the deposition time increased up to 34 hours. In other words, more materials will be deposited onto substrates for longer deposition time.
format Article
author Ho, Soon Min
author_facet Ho, Soon Min
author_sort Ho, Soon Min
title Characterization of nickel lead sulphide thin films: X-Ray diffraction studies
title_short Characterization of nickel lead sulphide thin films: X-Ray diffraction studies
title_full Characterization of nickel lead sulphide thin films: X-Ray diffraction studies
title_fullStr Characterization of nickel lead sulphide thin films: X-Ray diffraction studies
title_full_unstemmed Characterization of nickel lead sulphide thin films: X-Ray diffraction studies
title_sort characterization of nickel lead sulphide thin films: x-ray diffraction studies
publisher Asian Research Publishing Network
publishDate 2017
url http://eprints.intimal.edu.my/958/1/Characterization%20of%20nickel%20lead%20sulphide%20thin%20films%20X-Ray%20diffraction%20studies.pdf
http://eprints.intimal.edu.my/958/
_version_ 1644541350629081088
score 13.160551