Characterization of nickel lead sulphide thin films: X-Ray diffraction studies
In this work, nickel lead sulphide thin films were grown by inexpensive and simple method, namely chemical bath deposition technique. Nickel sulphate, sodium thiosulfate and lead nitrate as the sources of Ni2+, S2- and Pb2+ ions, respectively. The effect of deposition period will be studied from 8...
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2017
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my-inti-eprints.9582017-11-16T06:12:09Z http://eprints.intimal.edu.my/958/ Characterization of nickel lead sulphide thin films: X-Ray diffraction studies Ho, Soon Min TA Engineering (General). Civil engineering (General) In this work, nickel lead sulphide thin films were grown by inexpensive and simple method, namely chemical bath deposition technique. Nickel sulphate, sodium thiosulfate and lead nitrate as the sources of Ni2+, S2- and Pb2+ ions, respectively. The effect of deposition period will be studied from 8 to 34 hours at room temperature. The obtained films were characterized by X-ray diffraction. The results reveal that the number of peaks was increased from two to five peaks as the deposition time increased up to 34 hours. In other words, more materials will be deposited onto substrates for longer deposition time. Asian Research Publishing Network 2017 Article PeerReviewed text en http://eprints.intimal.edu.my/958/1/Characterization%20of%20nickel%20lead%20sulphide%20thin%20films%20X-Ray%20diffraction%20studies.pdf Ho, Soon Min (2017) Characterization of nickel lead sulphide thin films: X-Ray diffraction studies. ARPN Journal of Engineering and Applied Sciences, 12 (15). pp. 4378-4382. ISSN 1819-6608 |
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TA Engineering (General). Civil engineering (General) Ho, Soon Min Characterization of nickel lead sulphide thin films: X-Ray diffraction studies |
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In this work, nickel lead sulphide thin films were grown by inexpensive and simple method, namely chemical bath
deposition technique. Nickel sulphate, sodium thiosulfate and lead nitrate as the sources of Ni2+, S2- and Pb2+ ions,
respectively. The effect of deposition period will be studied from 8 to 34 hours at room temperature. The obtained films
were characterized by X-ray diffraction. The results reveal that the number of peaks was increased from two to five peaks
as the deposition time increased up to 34 hours. In other words, more materials will be deposited onto substrates for longer
deposition time. |
format |
Article |
author |
Ho, Soon Min |
author_facet |
Ho, Soon Min |
author_sort |
Ho, Soon Min |
title |
Characterization of nickel lead sulphide thin films: X-Ray diffraction studies |
title_short |
Characterization of nickel lead sulphide thin films: X-Ray diffraction studies |
title_full |
Characterization of nickel lead sulphide thin films: X-Ray diffraction studies |
title_fullStr |
Characterization of nickel lead sulphide thin films: X-Ray diffraction studies |
title_full_unstemmed |
Characterization of nickel lead sulphide thin films: X-Ray diffraction studies |
title_sort |
characterization of nickel lead sulphide thin films: x-ray diffraction studies |
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Asian Research Publishing Network |
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2017 |
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http://eprints.intimal.edu.my/958/1/Characterization%20of%20nickel%20lead%20sulphide%20thin%20films%20X-Ray%20diffraction%20studies.pdf http://eprints.intimal.edu.my/958/ |
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