Thin film sputter-deposition of AlN crystals in oxygenated chamber: a pilot study

Aluminium nitride (AIN)is a promising thin film electrical insulation material layer in electronic devices. The magnetron sputtering method is usually employed to sputter-deposit AlN thin film on silicon (Si)substrate using a pure aluminium (Al) metallic target in a low base pressure vacuum conditio...

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Main Authors:	Abd Samad, Muhammad Izzuddin, Badrudin, Syazwani Izrah, Mansor, Marwan, Nayan, Nafarizal, Abu Bakar, Ahmad Shuhaimi, Yusop, Mohd Zamri, Latif, Rhonira
Format:	Article
Language:	en
Published:	Iop 2025
Subjects:	TA Engineering (General). Civil engineering (General)
Online Access:	http://eprints.uthm.edu.my/12668/1/J19336_a2b3a08345b5ad1b15c1364d6a67e68e.pdf http://eprints.uthm.edu.my/12668/ https://doi.org/10.1088/2053-1591/ad9b70
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