A review of focused ion beam sputtering
This paper reviews the applications of focused ion beam (FIB) sputtering for micro/nano fabrication. Basic principles of FIB were briefly discussed, and then empirical and fundamental models for sputtering yield, material removal rate, and surface roughness were presented and compared. The empirical...
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| Main Authors: | , , |
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| Format: | Article |
| Language: | en |
| Published: |
Springer
2010
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| Subjects: | |
| Online Access: | http://irep.iium.edu.my/2424/1/IJPEM_2010_11_%281%29_157-170.pdf http://irep.iium.edu.my/2424/ http://www.springerlink.com/content/uvg16626242333tu/ |
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