Characterization of alignment strategy to achieve a reliable alignment accuracy in advanced lithography
One of the most crucial challenges in lithography is achieving rapid and accurate alignment under a wide variety of conditions brought about by different processing steps. Processing steps may change the nature of alignment mark. Either the mark is deformed or the mark proļ¬le is asymmetric, a change...
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| Main Authors: | , , , |
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| Format: | Article |
| Language: | en |
| Published: |
2007
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| Online Access: | http://journalarticle.ukm.my/1459/1/2007-Article_2_K-19.pdf http://journalarticle.ukm.my/1459/ http://www.ukm.my/jkukm/index.php/jkukm |
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