Preparation of high purity SiO2 from Rice Husk
A high purity silicon dioxide (97.08%) was obtained by atmosphere thermal decomposition of the acetic acid leached rice husk at 800°C for 15 minutes. Leaching process parameters such as pH of the acid solution, leaching temperature and time were varied. Analysis of all the acid leached thermal decom...
保存先:
第一著者: | |
---|---|
その他の著者: | |
フォーマット: | |
言語: | English |
出版事項: |
Universiti Malaysia Perlis
2009
|
主題: | |
オンライン・アクセス: | http://dspace.unimap.edu.my/xmlui/handle/123456789/4854 |
タグ: |
タグ追加
タグなし, このレコードへの初めてのタグを付けませんか!
|