Ali, M. F., & (Advisor), R. A. R. (2008). Study of the thickness of the Silicon Dioxide on wafer using Dry and Wet Oxidation method. Universiti Malaysia Perlis.
استشهاد بنمط شيكاغوAli, Mohamad Fadzli, and Ruslinda A. Rahim (Advisor). Study of the Thickness of the Silicon Dioxide On Wafer Using Dry and Wet Oxidation Method. Universiti Malaysia Perlis, 2008.
MLA استشهادAli, Mohamad Fadzli, and Ruslinda A. Rahim (Advisor). Study of the Thickness of the Silicon Dioxide On Wafer Using Dry and Wet Oxidation Method. Universiti Malaysia Perlis, 2008.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.