Structural characteristics of samarium oxynitride on silicon substrate

• المؤلفون الرئيسيون: Goh, K.H., Haseeb, A.S. Md. Abdul, Wong, Y.H.
• التنسيق: مقال
• منشور في: Elsevier 2017
• الموضوعات: TJ Mechanical engineering and machinery
• الوصول للمادة أونلاين: http://eprints.um.edu.my/17554/; https://doi.org/10.1016/j.jallcom.2017.06.179

Thermal oxynitridation of 20 nm sputtered pure samarium metal film on silicon substrates were carried out in nitrous oxide gas ambient at various temperatures (600–900 °C) for 15 min. Influences of the oxynitridation temperature on the structural and chemical properties of the SmxOyNz films had been...